"Techno(Stress) and Techno(Distress): Validation of a Specific ..."

Nathalie Cadieux et al. (2020)

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DOI: —

access: open

type: Conference or Workshop Paper

metadata version: 2022-05-04

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  dblp key:
  - conf/hicss/CadieuxCYM20
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  - https://dblp.org/rec/conf/hicss/CadieuxCYM20
Nathalie Cadieux, Jean Cadieux, Nancy Youssef, Elaine Mosconi:
Techno(Stress) and Techno(Distress): Validation of a Specific TechnoStressors Index (TSI) Among Quebec Lawyers. HICSS 2020: 1-10

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