"Strontium doped hafnium oxide thin films: Wide process window for ..."

Tony Schenk et al. (2013)

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DOI: 10.1109/ESSDERC.2013.6818868

access: closed

type: Conference or Workshop Paper

metadata version: 2024-10-06

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Tony Schenk, Stefan Mueller, Uwe Schroeder, Robin Materlik, Alfred Kersch, Mihaela Popovici, Christoph Adelmann, Sven Van Elshocht, Thomas Mikolajick:
Strontium doped hafnium oxide thin films: Wide process window for ferroelectric memories. ESSDERC 2013: 260-263

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