"Improved low-frequency noise for 0.3nm EOT thulium silicate interfacial layer."

Maryam Olyaei et al. (2014)

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DOI: 10.1109/ESSDERC.2014.6948835

access: closed

type: Conference or Workshop Paper

metadata version: 2022-10-02

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Maryam Olyaei, B. Gunnar Malm, Eugenio Dentoni Litta, Per-Erik Hellström, Mikael Östling:
Improved low-frequency noise for 0.3nm EOT thulium silicate interfacial layer. ESSDERC 2014: 361-364

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