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"Ultrathin Gate Dielectric Enabled by Nanofog Aluminum Oxide on Monolayer MoS2."
Jung-Soo Ko et al. (2023)
- Jung-Soo Ko, Zichen Zhang, Sol Lee, Marc Jaikissoon, Robert K. A. Bennett, Kwanpyo Kim, Andrew C. Kummel, Prabhakar Bandaru, Eric Pop, Krishna C. Saraswat:
Ultrathin Gate Dielectric Enabled by Nanofog Aluminum Oxide on Monolayer MoS2. ESSDERC 2023: 1-4
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