"Radical oxidation process for hybrid SAM/HfOx gate dielectrics in MoS2 FETs."

Takamasa Kawanago et al. (2017)

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DOI: 10.1109/ESSDERC.2017.8066605

access: closed

type: Conference or Workshop Paper

metadata version: 2017-10-19

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Takamasa Kawanago, Ryo Ikoma, Tomoaki Oba, Hiroyuki Takagi:
Radical oxidation process for hybrid SAM/HfOx gate dielectrics in MoS2 FETs. ESSDERC 2017: 114-117

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