"On the Topography Simulation of Memory Cell Trenches for Semiconductor ..."

Clemens Heitzinger, Siegfried Selberherr (2002)

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DOI: —

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type: Conference or Workshop Paper

metadata version: 2002-10-30

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  - https://dblp.org/rec/conf/esm/HeitzingerS02
Clemens Heitzinger, Siegfried Selberherr:
On the Topography Simulation of Memory Cell Trenches for Semiconductor Manufacturing Deposition Processes using the Level Set Method. ESM 2002: 653-660

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