"LithoGAN: End-to-End Lithography Modeling with Generative Adversarial ..."

Wei Ye et al. (2019)

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DOI: 10.1145/3316781.3317852

access: closed

type: Conference or Workshop Paper

metadata version: 2021-08-08

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  persistent URL:
  - https://dblp.org/rec/conf/dac/YeALP19
Wei Ye, Mohamed Baker Alawieh, Yibo Lin, David Z. Pan:
LithoGAN: End-to-End Lithography Modeling with Generative Adversarial Networks. DAC 2019: 107

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