"Cutting structure-aware analog placement based on self-aligned double ..."

Hung-Chih Ou, Kai-Han Tseng, Yao-Wen Chang (2015)

> Home

Details and statistics

DOI: 10.1145/2744769.2744813

access: closed

type: Conference or Workshop Paper

metadata version: 2018-11-06

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - conf/dac/OuTC15
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/conf/dac/OuTC15
Hung-Chih Ou, Kai-Han Tseng, Yao-Wen Chang:
Cutting structure-aware analog placement based on self-aligned double patterning with e-beam lithography. DAC 2015: 190:1-190:6

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.