"Continual Diffusion with STAMINA: STack-And-Mask INcremental Adapters."

James Seale Smith et al. (2024)

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DOI: 10.1109/CVPRW63382.2024.00181

access: closed

type: Conference or Workshop Paper

metadata version: 2024-10-10

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James Seale Smith, Yen-Chang Hsu, Zsolt Kira, Yilin Shen, Hongxia Jin:
Continual Diffusion with STAMINA: STack-And-Mask INcremental Adapters. CVPR Workshops 2024: 1744-1754

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