"A fabrication method for high performance embedded DRAM of 0.18 μm ..."

T. Yoshida et al. (2000)

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DOI: 10.1109/CICC.2000.852618

access: closed

type: Conference or Workshop Paper

metadata version: 2022-10-10

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T. Yoshida, H. Takato, T. Sakurai, K. Kokubun, K. Hiyama, A. Nomachi, Y. Takasu, M. Kishida, H. Ohtsuka, H. Naruse, Y. Morimasa, N. Yanagiya, T. Hashimoto, T. Noguchi, T. Miyamae, N. Iwabuchi, M. Tanaka, J. Kumagai, H. Ishiuchi:
A fabrication method for high performance embedded DRAM of 0.18 μm generation and beyond. CICC 2000: 61-64

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