"Lithography and design integration - New paradigm for the technology ..."

Jongwook Kye et al. (2012)

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DOI: 10.1109/CICC.2012.6330685

access: closed

type: Conference or Workshop Paper

metadata version: 2017-05-17

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Jongwook Kye, Yuansheng Ma, Lei Yuan, Yunfei Deng, Harry J. Levinson:
Lithography and design integration - New paradigm for the technology architecture development. CICC 2012: 1-4

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