"45nm high-k + metal gate strain-enhanced CMOS transistors."

Chris Auth (2008)

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DOI: 10.1109/CICC.2008.4672101

access: closed

type: Conference or Workshop Paper

metadata version: 2017-05-17

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Chris Auth:
45nm high-k + metal gate strain-enhanced CMOS transistors. CICC 2008: 379-386

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