"A new graph-theoretic, multi-objective layout decomposition framework for ..."

Jae-Seok Yang et al. (2010)

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DOI: 10.1109/ASPDAC.2010.5419807

access: closed

type: Conference or Workshop Paper

metadata version: 2017-05-26

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  - https://dblp.org/rec/conf/aspdac/YangLCYP10
Jae-Seok Yang, Katrina Lu, Minsik Cho, Kun Yuan, David Z. Pan:
A new graph-theoretic, multi-objective layout decomposition framework for double patterning lithography. ASP-DAC 2010: 637-644

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