"Statistics pattern analysis based virtual metrology for plasma etch processes."

Q. Peter He et al. (2012)

> Home

Details and statistics

DOI: 10.1109/ACC.2012.6315618

access: closed

type: Conference or Workshop Paper

metadata version: 2023-10-05

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - conf/amcc/HeWGSG12
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/conf/amcc/HeWGSG12
Q. Peter He, Jin Wang, Hector E. Gilicia, John D. Stuber, Bhalinder S. Gill:
Statistics pattern analysis based virtual metrology for plasma etch processes. ACC 2012: 4897-4902

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.