default search action
"Fabrication and characterization of ZnO/Al2O3 thin film transistors: ..."
Walid Filali et al. (2022)
- Walid Filali, Fouaz Lekoui, Boumediene Zatout, Laid Henni, Sidali Abdelmoumene, Elyes Garoudja, Rachid Amrani, Slimane Oussalah:
Fabrication and characterization of ZnO/Al2O3 thin film transistors: channel length effect study. SSD 2022: 544-548
manage site settings
To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.