"Real-time virtual metrology and control of etch rate in an industrial ..."

Shane A. Lynn, Niall MacGearailt, John V. Ringwood (2012)

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DOI: 10.1109/CCA.2012.6402659

access: closed

type: Conference or Workshop Paper

metadata version: 2017-05-29

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Shane A. Lynn, Niall MacGearailt, John V. Ringwood:
Real-time virtual metrology and control of etch rate in an industrial plasma chamber. CCA 2012: 1658-1663

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