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H. D. B. Gottlob

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2005
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Max Christian Lemme, J. K. Efavi, H. D. B. Gottlob, Thomas Mollenhauer, Thorsten Wahlbrink, Heinrich Kurz:
Comparison of metal gate electrodes on MOCVD HfO₂. Microelectron. Reliab. 45(5-6): 953-956 (2005)

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