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Gottlieb S. Oehrlein

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1990 – 1999

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1999
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Gottlieb S. Oehrlein, Marcus F. Doemling, Bernd E. E. Kastenmeier, Peter J. Matsuo, Neal R. Rueger, Marc Schaepkens, Theodorus E. F. M. Standaert:
Surface science issues in plasma etching. IBM J. Res. Dev. 43(1): 181-198 (1999)
1992
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Gottlieb S. Oehrlein, John F. Rembetski:
Plasma-based dry etching techniques in the silicon integrated circuit technology. IBM J. Res. Dev. 36(2): 140-157 (1992)

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