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Wayne M. Moreau

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2000 – 2009

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2001
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David R. Medeiros, Ari Aviram, C. Richard Guarnieri, Wu-Song Huang, Ranee Kwong, Christopher K. Magg, Arpan P. Mahorowala, Wayne M. Moreau, Karen E. Petrillo, Marie Angelopoulos:
Recent progress in electron-beam resists for advaced mask-making. IBM J. Res. Dev. 45(5): 639-650 (2001)

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