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Jung-Uk An

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2008
[j1]
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Seol-Min Yi, Kwang-Ho Jang, Jung-Uk An, Sang-Soo Hwang, Young-Chang Joo:
The self-formatting barrier characteristics of Cu-Mg/SiO₂ and Cu-Ru/SiO₂ films for Cu interconnects. Microelectron. Reliab. 48(5): 744-748 (2008)

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