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Leapheng Uon

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2023
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Afif Hamzens, Kento Kitamura, Shota Mochizuki, Leapheng Uon, Hiromasa Ohmi, Hiroaki Kakiuchi:
Organosilicon-Based Thin Film Formation in Very High-Frequency Plasma Under Atmospheric Pressure. Int. J. Autom. Technol. 17(6): 575-582 (2023)

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