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2020 – today
- 2023
[j2]Tim Maiwald
, Teng Li, George-Roberto Hotopan, Katharina Kolb, Karina Disch, Julian Potschka, Alexander Haag, Marco Dietz, Björn Debaillie, Thomas Zwick, Klaus Aufinger, Dieter Ferling, Robert Weigel, Akshay Visweswaran:
A Review of Integrated Systems and Components for 6G Wireless Communication in the D-Band. Proc. IEEE 111(3): 220-256 (2023)- 2021
- [j1]Tim Maiwald, Julian Potschka, Katharina Kolb, Marco Dietz, Amelie Hagelauer, Akshay Visweswaran, Robert Weigel:
A Broadband Zero-IF Down-Conversion Mixer in 130 nm SiGe BiCMOS for Beyond 5G Communication Systems in D-Band. IEEE Trans. Circuits Syst. II Express Briefs 68(7): 2277-2281 (2021) - 2020
- [c5]Katharina Kolb, Julian Potschka, Tim Maiwald, Klaus Aufinger, Amelie Hagelauer, Marco Dietz, Robert Weigel:
A 28 GHz Highly Accurate Phase- and Gain-Steering Transmitter Frontend for 5G Phased-Array Applications. MWSCAS 2020: 432-435 - [c4]Julian Potschka, Julian Zuber, Katharina Kolb, Tim Maiwald, Marco Dietz, Amelie Hagelauer, Klaus Aufinger, Robert Weigel:
A Switchable, Passively Tuneable 28 GHz to 39 GHz Upconversion Link for a 5G Repeater using a Broadside Coupler and Analog Predistortion in a 130 nm BiCMOS Technology. NEWCAS 2020: 30-33 - [c3]Tim Maiwald, Albert-Marcel Schrotz, Katharina Kolb, Julian Potschka, Marco Dietz, Amelie Hagelauer, Robert Weigel:
A Technology Independent Synthesis Approach for Integrated mmWave Coupled Line Circuits. RWS 2020: 259-261 - [c2]Julian Potschka, Marco Dietz, Katharina Kolb, Tim Maiwald, Dieter Ferling, Amelie Hagelauer, Robert Weigel:
A Tuneable Fully Single-Ended 39GHz to 28GHz Gilbert Micromixer for 5G Using Analog Predistortion in a 130nm BiCMOS Technology. RWS 2020: 334-336
2010 – 2019
- 2019
- [c1]Julian Potschka, Christopher Soell, Jens Kirchner, Christian Mardin, Markus Stadelmayer, Tim Maiwald, Sascha Breun, Katharina Kolb, Andreas Bauch, Marco Dietz, Christopher Beck, Matthias Völkel, Amelie Hagelauer, Robert Weigel:
Design of an Integrated Subretinal Implant using Cellular Neural Networks for Binary Image Generation in a 130 nm BiCMOS Process. EMBC 2019: 5268-5273
Coauthor Index
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