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David C. T. Or

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2003
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David C. T. Or, Pui-To Lai, Johnny K. O. Sin, Paul C. K. Kwok, Jing-Ping Xu:
Enhanced reliability for low-temperature gate dielectric of MOS devices by N₂O or NO plasma nitridation. Microelectron. Reliab. 43(1): 163-166 (2003)

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