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PPAP@SANER 2016: Suita, Osaka, Japan
- Third International Workshop on Patterns Promotion and Anti-patterns Prevention, PPAP@SANER 2016, Osaka, Japan, March 15, 2016. IEEE Computer Society 2016, ISBN 978-1-5090-1855-0
- Tsubasa Saika, Eunjong Choi, Norihiro Yoshida, Shusuke Haruna, Katsuro Inoue:
Do Developers Focus on Severe Code Smells? 1-3 - Nadia Nahar, Kazi Sakib:
ACDPR: A Recommendation System for the Creational Design Patterns Using Anti-patterns. 4-7 - Ahmad Tahmid, Nadia Nahar, Kazi Sakib:
Understanding the Evolution of Code Smells by Observing Code Smell Clusters. 8-11
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